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Seeking to regain process leadership from TSMC, Intel refused to make the same mistake twice

Intel says that its two High-NA EUV lithography machines are in use and are an improvement over the OG EUV equipment.

Feb 25, 2025 - 19:49
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Seeking to regain process leadership from TSMC, Intel refused to make the same mistake twice
Intel says that its two High-NA EUV lithography machines are in use and are an improvement over the OG EUV equipment.
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